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dc.contributor.authorBach, P. L.
dc.contributor.authorVila-Fungueiriño, José M.
dc.contributor.authorLeborán Alvarez, Víctor
dc.contributor.authorFerreiro Vila, Elías
dc.contributor.authorRodríguez-González, Benito
dc.contributor.authorRivadulla Fernández, José Francisco
dc.date.accessioned2018-07-16T10:17:36Z
dc.date.available2018-07-16T10:17:36Z
dc.date.issued2013
dc.identifier.citationBach, P., Vila-Fungueiriño, J., Leborán, V., Ferreiro-Vila, E., Rodríguez-González, B., & Rivadulla, F. (2013). Strain-induced enhancement of the thermoelectric power in thin films of hole-doped La2NiO4+δ. APL Materials, 1(2), 021101. doi: 10.1063/1.4818356
dc.identifier.urihttp://hdl.handle.net/10347/17039
dc.description.abstractWe propose a novel route for optimizing the thermoelectric power of a polaronic conductor, independent of its electronic conductivity. This mechanism is exemplified here in thin-films of La2NiO4+δ. Tensile stress induced by epitaxial growth on SrTiO3 doubles the thermoelectric power of ≈15 nm thick films relative to ≈90 nm films, while the electronic conductivity remains practically unchanged. Epitaxial strain influences the statistical contribution to the high temperature thermopower, but introduces a smaller correction to the electronic conductivity. This mechanism provides a new way for optimizing the high temperature thermoelectric performance of polaronic conductors
dc.description.sponsorshipThis work was supported by the European Research Council (ERC StG-259082, 2DTHERMS), and Ministerio de Economía y Competitividad of Spain through the project MAT2010-16157, and a Ph.D. grant of the FPI program (J.M.V.-F.)
dc.language.isoeng
dc.publisherAIP Publishing
dc.rights© 2013 The Author(s). Published by AIP Publishing. This work is is licensed under a Creative Commons Attribution 3.0 Unported License
dc.rights.urihttps://creativecommons.org/licenses/by/3.0/
dc.titleStrain-induced enhancement of the thermoelectric power in thin films of hole-doped La2NiO4+δ
dc.typejournal article
dc.identifier.doi10.1063/1.4818356
dc.relation.publisherversionhttps://doi.org/10.1063/1.4818356
dc.type.hasVersionVoR
dc.identifier.essn2166-532X
dc.rights.accessRightsopen access
dc.contributor.affiliationUniversidade de Santiago de Compostela. Centro de Investigación en Química Biolóxica e Materiais Moleculares
dc.contributor.affiliationUniversidade de Santiago de Compostela. Departamento de Química Física
dc.description.peerreviewedSI
dc.relation.projectIDinfo:eu-repo/grantAgreement/EC/FP7/259082


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© 2013 The Author(s). Published by AIP Publishing. This work is is licensed under a Creative Commons Attribution 3.0 Unported License
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 © 2013 The Author(s). Published by AIP Publishing. This work is is licensed under a Creative Commons Attribution 3.0 Unported License





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